TY  - BOOK
AU  - Guilei Wang
TI  - Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
SN  - 9789811500466
PB  - Springer
UR  - https://link.springer.com/openurl?genre=book&isbn=978-981-15-0046-6
ER  -