| 000 | 00710nam a2200265Ia 4500 | ||
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| 005 | 20260121171424.0 | ||
| 008 | 008 260114s9999 xx 000 0 eng d | ||
| 020 | _a9789811500466 | ||
| 037 | _aEBOOK | ||
| 040 | _aCRL | ||
| 040 | _beng | ||
| 040 | _cCRL | ||
| 041 | _2eng | ||
| 041 | _aeng | ||
| 084 | _qCRL | ||
| 100 |
_aGuilei Wang _91076042 |
||
| 245 | 0 | _aInvestigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond | |
| 260 | _bSpringer | ||
| 260 | _bSpringer | ||
| 260 | _c2019 | ||
| 856 | _uhttps://link.springer.com/openurl?genre=book&isbn=978-981-15-0046-6 | ||
| 942 | _cEBOOK | ||
| 999 |
_c1641772 _d1641772 |
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