000 00745nam a2200265Ia 4500
003 OSt
005 20220912150706.0
006 a|||||r|||| 00| 0
007 ta
008 220909b |||||||| |||| 00| 0 eng d
024 _a31521
037 _cTextual
040 _aCSL
_beng
_cCSL
041 _aeng
082 _aD65,4,T, L0
100 _aMayer James W
245 0 _cMayer James W; Eriksson L; Davies J A
_aIon implantation in semiconductors: silicon and germanium
260 _aNew York
_b Academic Press
_c1970
300 _axiii, 280p.
_ccm.
500 _aAppendix A.1-A.4, 250254p.
_ccm.
700 _a Davies J A
700 _a Eriksson L
942 _hD65,4,T, L0
_cTEXL
_2CC
999 _c52813
_d52813