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Photoresists for microlithography Evaluation and characterization of microstructure of novel cardanol based and other novolac copolymers using multidimensional NMR techniques

Roy Debmalya

Photoresists for microlithography Evaluation and characterization of microstructure of novel cardanol based and other novolac copolymers using multidimensional NMR techniques - 2003

Standard No.: 78664

Source: Theses

Subjects--Topical Terms:
CHEMISTRY

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