Oxide and nitride semiconductors:processing, properties, and applications by Yao Takafumi Ed.; Hong Soon-Ku Ed.
Material type:
TextLanguage: English Series: Advances in materials researchPublication details: Berlin Springer 2009Description: xiv, 517p. cmISBN: - 9783540888468 (hbd)
- C6:212OaE3150, P9 TC
| Item type | Current library | Home library | Call number | Status | Barcode | |
|---|---|---|---|---|---|---|
Textbook
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Central Science Library | Central Science Library | C6:212OaE3150 P9 TC (Browse shelf(Opens below)) | Available | SL1444282 |
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| C6:212g N8 Handbook of semiconductor interconnection technology | C6:212g P3 TC RF and microwave semiconductor device handbook | C6:212g Q3 Materials and reliability handbook for semiconductor optical and electron devices | C6:212OaE3150 P9 TC Oxide and nitride semiconductors:processing, properties, and applications | C6:212p1,N72 L3 Proceeding on Ion implantation in semiconductors and other materials | C6:212p1,N74 L5 Proceedings on lattice defects in semiconductor | C6:212p1,N76 L7 Proceeding on Ion implantation in semiconductors |
Includes bibliographical references.; 'Index 507-517p.
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